Regensburg 2007 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 49: Nanostructures at Surfaces V (Self Organization of Molecules)

O 49.3: Vortrag

Donnerstag, 29. März 2007, 11:45–12:00, H36

Chemical nanopatterning of aromatic self-assembled monolayers — •Mark Schnietz¹, Andrey Turchanin¹, Mohamed El-Desawy¹, Harun Solak², and Armin Gölzhäuser¹ — ¹Physics of Supramolecular Systems, Department of Physics, University of Bielefeld, D-33615 Bielefeld — ²Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, 5132 Villigen PSI, Switzerland

Well-defined immobilization of single molecules, molecular arrays and biological objects on solid substrates is of great importance for many areas of fundamental and applied research. Chemically-patterned self-assembled monolayers (SAMs) may play a key role in reaching this goal. We applied extreme UV-interference lithography (EUV-IL) for generation of chemical nanopatterns in 4*-nitro-1,1*-biphenyl-4-thiol (NBPT) SAMs on Au-coated substrates. X-ray photoelectron spectroscopy and atomic force microscopy were employed for characterization. We show that EUV-irradiation converts terminal nitro groups of a NBPT into amino groups while the underlying aromatic groups are dehydrogenated and cross-linked. Large area nitro/amino line/space patterns (1*0.5 mm2) with a line width of about 50 nm were obtained with this approach. We used the resulting chemical nanopatterns for the preparation of biologically relevant interfaces in exchange and grafting type experiments.