Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

O: Fachverband Oberflächenphysik

O 9: Oxides and Insulators: Adsorption I

O 9.3: Vortrag

Montag, 26. März 2007, 11:45–12:00, H42

High resolution imaging of stable and mobile water related defects on fluoride (111) surfaces — •Frank Ostendorf, Sabine Hirth, Lutz Tröger, and Michael Reichling — Fachbereich Physik, Barbarastrasse 7, 49076 Osnabrück

Fluoride (111) surfaces are chemically rather inert and surface degradation due to the interaction with the residual gas of a UHV system is a slow process. Atomic surface features occurring during this process and during a controlled exposure to water were investigated with highest resolution dynamic force microscopy and are analysed in detail. Two distinct types of defect features arise, namely stable defects that can be associated with specific ionic positions on the surface and mobile defects for which we have recently shown that they can be manipulated on the surface [1]. We discuss the kinetics of defect formation and phenomena of defect clustering on the basis of experiments involving a systematic variation of gas exposure parameters. From the experimental evidence we, furthermore, draw conclusions about the identity of the defects being either molecular water adsorbed onto the surface or dissociated water with hydroxyl groups embedded into the surface.

[1] Hirth S, Ostendorf F and Reichling M Nanotechnology 17 (2006) S148