Regensburg 2007 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
SYOE: Symposium Organic Thin Film Electronics: From Molecular Contacts to Devices
SYOE 8: Poster Session SYOE
SYOE 8.50: Poster
Dienstag, 27. März 2007, 18:00–20:00, Poster B
Systematic studies on the morphology of OVPD processed films upon substrate temperature and deposition rate — •Azadeh Farahzadi1, Phenwisa Niyamakom1, Maryam Beigmohamadi1, Chritian Effertz1, Nico Meyer2, Dietmar Keiper2, Michael Heuken2,4, Holger Schwab3, Mohammad Reza Rahimi Tabar5,6, Thomas Michely1, and Matthias Wuttig1 — 1Institute of Physics (IA), RWTH Aachen University of Technology, 52056 Aachen, Germany — 2AIXTRON AG, Kackertstr. 15-17, 52072 Aachen, Germany — 3Philips Technologie GmbH, Philipsstr. 8, 52066 Aachen, Germany — 4Institute of Electromagnetic Theory, RWTH Aachen University of Technology, Kopernikusstr. 16, 52074 Aachen, Germany — 5CNRS UMR 6529, Observatoire de la Côte d'Azur, BP 4229, 06304 Nice Cedex 4, France — 6Department of physics, Sharif University of Technology, 11365-9161 Tehran, Iran
In order to tailor and modify thin film properties to be suitable for organic light emitting devices (OLED) it is necessary to study and understand the influence of deposition parameters on thin film growth. The chosen material is α-NPD processed by organic vapor-phase deposition (OVPD). Film growth in OVPD is controlled by three independent parameters which are deposition rate, substrate temperature and chamber pressure. Our study is focused on the influence of deposition rate and substrate temperature on the film morphology. A remarkable dependence of the film morphology upon deposition parameters has been observed. A detailed quantitative morphology analysis provides excellent description of the growth mechanism of OLED films.