Regensburg 2007 – scientific programme

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SYSE: Symposium Strain-Engineering for New Functional Structures

SYSE 2: Strain engineering in ferroics and photonics

SYSE 2.3: Invited Talk

Monday, March 26, 2007, 17:00–17:30, H1

Patterning ferroelectric nanostructures by epitaxial strain — •Ho Nyung Lee and Matthew Chisholm — Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA

Strained, single-crystalline nanoferroelectrics were produced in a method that complements recent progress towards reducing the size of ferroelectric structures by e-beam direct writing, focused ion beam etching, and self-assembly. Processes such as FIB milling or reactive ion etching suffer from the disadvantage of chemical damage induced by the nature of the processes. Chemical solution derived nanoislands produced by self-assembly are sometimes problematic due to a lack of dimensional control and the presence of poly-crystalline phases and/or defects that cause severe degradation of physical properties. In this talk, we will present a novel method to produce strained single-crystalline nanoferroelectrics. Small feature sizes (< 40 nm) of PbZr_0.2Ti_0.8O₃ nanostructures can be readily produced, without employing any chemical etchants or mechanical patterning. In addition, a comparison of the properties of relaxed and strained films with both highly- and weakly-polar ferroelectrics will be presented, showing that the strong sensitivity of ferroelectric polarization to epitaxial strain varies considerably for different ferroelectric perovskites.

Research sponsored by the Division of Materials Sciences and Engineering, Office of Basic Energy Sciences, U.S. Department of Energy, under contract DE-AC05-00OR22725 with Oak Ridge National Laboratory, managed and operated by UT-Battelle, LLC.