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VA: Fachverband Vakuumphysik und Vakuumtechnik

VA 2: Desorption mechanisms and vacuum generation

VA 2.5: Vortrag

Montag, 26. März 2007, 12:45–13:00, H9

Process optimization from component-based Process Control to in-situ Advanced Process Control (APC) — •Benjamin Abraham and Gottfried Gerlach — AIS Automation Dresden GmbH, Germany, www.ais-automation.com

Complex vacuum technological processes have sometimes very small parameter ranges for an optimized working point to reach high qualities. The control of those processes is only possible with intelligent control systems. In-situ APC optimizes the technological process for more than one module or plant depending on quality determining parameters and can be used for complex multi chamber systems or a couple of machines. To utilize in-situ APC; a framework with multifarious interfaces to control systems, in-situ process sensors, control modules was developed by AIS together with Fraunhofer Institut FEP and Technical University Dresden, sponsored by Saxony Government. The framework must meet 2 main requirements: a.) versatile interfaces to adapt different applications and equipment components and b.) a freely configurable data distribution between the involved components.

The usage of innovative computing standards enables effective data dispatching, which can be configured graphically by the user. Numerous adapters are available to integrate the user preferred solutions for SPC, data mining, etc. The expert knowledge is transformed into a process model, which has to be integrated by a versatile adapter. Those can be done with C# or for prototypes Excel integration is applicable. The archive module enables the management of every structure of XML data like EDA self description.

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DPG-Physik > DPG-Verhandlungen > 2007 > Regensburg