Berlin 2008 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 13: Colloidal and Nanoparticles

CPP 13.14: Vortrag

Dienstag, 26. Februar 2008, 18:30–18:45, C 264

Optical mesurements on periodically ordered nanoscopic metal clusters on glass substrates — •Michael Weinl, Daniel Kraus, Jörg K. N. Lindner, and Bernd Stritzker — University of Augsburg, Institute of Physics, 86135 Augsburg

Nanosphere lithography (NSL) is a versatile, fast developing tool for fabricating large areas of nanoscopic, highly ordered metallic particles on a substrate surface. NSL uses self-assembled monolayers of colloidal particles as a deposition mask with the empty space between three adjoining nanospheres acting as mask opening. In comparison to e-beam lithography, NSL produces a great amount of defects but on the other hand it is a very fast and cost-effective technique. The fixed triangle geometry of pure nanosphere lithography can be augmented by angle-resolved evaporation or by plasma and ion beam modification of the masks. In this work, polystyrene nanospheres with a diameter of 200 to 1000 nm were used to fabricate colloidal mono- and doublelayers on glas and silicon substrates. Double layers can be used as masks with smaller mask openings and larger pitch, as compared to monolayers. Regular arrays of metallic nanodots were formed by physical vapour deposition of Au and Ag through these masks. The metal particle shape and size was determined by ESEM, AFM and TEM. An apparatus for the spatially resolved mesurement of optical absorption and transmission in the spectral range of 400 to 950 nm was developed to examine the optical properties of regular metal dot arrays. The lateral resolution also allows to observe the optical properties of structures created at mask defects.