Berlin 2008 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 29: Polymerphysics I
CPP 29.1: Vortrag
Donnerstag, 28. Februar 2008, 09:30–09:45, C 130
The physical resolution limit for replica molding — •Ovidiu D. Gordan1, Bo N. J. Persson2, Claudia M. Cesa1, Dirk Mayer3, Bernd Hoffmann1, Sabine Dieluweit1, and Rudolf Merkel1 — 1IBN-4, FZ-Jülich, 52425, Jülich, Germany — 2IFF, FZ-Jülich, 52425, Jülich, Germany — 3IBN-2, FZ-Jülich, 52425, Jülich, Germany
The key element of the fast evolution in the information technology is the ability to replicate patterns at increasingly lower scales. Besides photolithography, in the last decade, soft lithography[1] developed as a cheaper microfabrication alternative. This technique also allows to imprint micro-structures in polymers. Therefore today micro-patterned elastomer surfaces are widely used in micro-fluidics[2] and micro-contact printing. Moreover, it enables emerging techniques in biotechnology, where very soft microstructures are employed, to mimic physiological conditions for living cells. However, up to now the general understanding of pattern preservation during the molding process was limited to the rule of thumb ”the harder the better".
This study shows the analytical dependence of the molding fidelity of the elastomer stiffness, surface tensions and dimensions of the topographic features.
[1] Y. Xia and G. M. Whitesides, Annu. Rev. Mater. Sci. 28, 153 (1998).
[2] G. M. Whitesides, Nature 442, 368 (2006)