Berlin 2008 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 7: POSTERS Rheology

CPP 7.13: Poster

Montag, 25. Februar 2008, 16:45–19:00, Poster A

Depth profilling of lamella-forming block copolymer films using SFM with quasi in-situ etching treatment — Eva Max, Markus Hund, and •Larisa Tsarkova — Physikalische Chemie II, Universität Bayreuth, Germany

State-of-the-art SPMs have limited in-situ sample treatment capabilities. Aggressive treatments like plasma etching or etching in aggressive liquids typically require to remove the sample from the microscope. In consequence, time consuming procedures are needed if the same spot of the sample has to be imaged after the step-wise treatment. We report a first prototype of an SPM setup with quasi in-situ sample treatment capabilities which utilizes a modified commercial SPM (Dimension 3100, Veeco Instruments Inc.) and present recent experiments using this approach. Thin lamella-forming block copolymer films have been subjected to consecutive plasma etching, and the structure depth profile has been reconstructed.