Berlin 2008 – wissenschaftliches Programm
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DF: Fachverband Dielektrische Festkörper
DF 9: Poster
DF 9.6: Poster
Dienstag, 26. Februar 2008, 15:00–18:00, Poster G
Formation of nanoporous alumina films in sulphosalicylic acid solution — •Piotr Hamolka1, Igor Vrublevsky1, Vitaly Sokol1, and Liubou Hamolka2 — 1Department of Nano- and Microelectronics, BSUIR, Minsk, Republic of Belarus — 2The Institute of General and Inorganic Chemistry of the NAS of Belarus, Minsk, Republic of Belarus
This work presents the results studying the volume expansion factor of porous alumina films, formed by through anodizing of an aluminum foil of 11.5 µm thickness in a 0.6M sulphosalicylic acid solution. The thickness of porous alumina films was measured by an optical microscopy. The volume expansion factor of nanoporous alumina films in the range of anodizing current densities of 1.0 * 60 mA cm−1 varied from 1.23 to 1.64. The obtained results demonstrated linear dependence for the current density logarithm versus the inverse volume expansion factor. The curve on this plot was found to be consisted of two subsequential rectilinear regions. We suggested that the change in the film oxide growth is the evidence of modification of the structure of Helmholtz layer in the sulphosalicylic acid electrolyte with increasing of anodizing current. The structure of oxide films obtained at different anodizing current densities was studied with thermogravimetric analysis.