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DPG

Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 11: Thin Film Characterisation: Structure Analyse and Composition (XRD, TEM, XPS, SIMS, RBS, ...)

DS 11.7: Vortrag

Dienstag, 26. Februar 2008, 11:00–11:15, H 2013

The interplay of PVD growth parameter and nanostructuring of C:V and C:Co nanocomposites — •Markus Berndt, Gintautas Abrasonis, Matthias Krause, Arndt Mücklich, Andreas Kolitsch, and Wolfhard Möller — Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf,D-01314 Dresden, Germany

The growth regimes of C:V and C:Co nanocomposite thin films (metal content of ≈  15 and 30 at.%) grown by ion beam co-sputtering in the temperature range of RT-500C are investigated. X-ray diffraction (XRD), transmission electron microscopy (TEM) and Raman spectroscopy at two excitation wavelengths (532 nm and 785 nm) have been used to characterize the microstructure of carbon and metal coexisting constituents of the nanocomposites. In order to reveal the influence of the transition metal on the encapsulating matrix, pure carbon films were deposited at the same temperatures.

C:Co and C:V nanocomposites exhibit a fine-grained structure at deposition temperatures below 300C. At higher temperatures C:Co films tend to form nanocolumns, whereas the globular structure is preserved for C:V. X-ray patterns show low degree of crystallinity of the nanoparticles in C:Co and C:V composites.

Raman spectroscopy results show that the presence of metal significantly enhances the formation of aromatic clusters. This enhancement occurs independently on metal nanoparticle size, shape and phase.

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