Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 13: Optical Layers: Basic Research and Applications

DS 13.2: Hauptvortrag

Dienstag, 26. Februar 2008, 10:15–10:45, H 2032

Innovative stationary and in-line sputter technologies for precision optical coatings — •Peter Frach, Hagen Bartzsch, Joern-Steffen Liebig, Joern Weber, and Volker Kirchhoff — Fraunhofer-Institut fuer Elektronenstrahl- und Plasmatechnik,Winterbergstr. 28, 01277 Dresden, Germany

In this paper different new concepts for precision optical and antireflective coatings deposited by reactive Pulse Magnetron Sputtering (PMS) are introduced. In the first part features of stationary coating technology using various reactive gases and gas mixtures will be explained. The precise control of gas flow and process conditions during reactive sputtering of a silicon target in a mixture of oxygen and nitrogen gas allows to deposit layer systems with stepwise or gradient variation of the refractive index. Examples of AR-coatings, rugate and different filters based on SixOyNz coatings could proof the required optical performance as well as several application relevant properties like low internal stress, low roughness, high stability at temperature and humidity changes and at high density laser pulses. The complete coating can be done highly efficient at only one deposition station without interruption of the plasma. In the second part of the paper a new in-line coating system for precision optics with very strict requirements on accuracy, thickness uniformity and reproducibility will be presented that is based on two highly stabilized Pulse Magnetron Sputtering stations and a precision substrate transport system combined with an intermediate in-situ measurement.