Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 13: Optical Layers: Basic Research and Applications
DS 13.3: Hauptvortrag
Dienstag, 26. Februar 2008, 10:45–11:15, H 2032
Novel Process Concepts for Ion Beam Sputtering Deposition — •Kai Starke1,2, Henrik Ehlers1, Marc Lappschies1, Nils Beermann1, and Detlev Ristau1 — 1Laser Zentrum Hannover e.V., Hannover, Germany — 2Cutting Edge Coatings GmbH
The application of charged noble gas beams with high ion current densities is of special scientific and economic importance for the production of highest quality thin film coatings. The ion beam sputtering process is known for the production of functional coatings of extreme optical performance concerning spectral characteristics, optical losses and damage resistance. During recent years, a tremendous increase in layer thickness precision has been achieved on the basis of broad-band optical monitoring techniques. Even complex thin film designs such as thin film polarizers, multi-band fluorescence filters and chirped mirrors can be manufactured without trial coating runs. Furthermore, an innovative process adaptation allows for the composition of material mixtures by co-deposition of two dielectric materials. This technique opens the field of novel optical materials with tailored properties and new thin film designs strategies like Rugate-filters. E.g. for TixSi1-xO2-mixture coatings, a distinctly increased damage threshold for ns-NIR pulses and a higher temperature resistance have been observed.