Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films
DS 17.22: Poster
Dienstag, 26. Februar 2008, 09:30–13:30, Poster A
Carbon-Metal-Nanocomposites: Self-organization of multilayers during the co-deposition of energetic ions — •Hayo Zutz1, Dominika Lyzwa1, Inga Gerhards1, Carsten Ronning1, Michael Seibt2, and Hans Hofsäss1 — 1II. Physikalisches Institut, Universität Göttingen, Friedich-Hund-Platz 1, 37077 Göttingen — 2IV. Physikalisches Institut, Universität Göttingen, Friedich-Hund-Platz 1, 37077 Göttingen
Thin film growth of metal-carbon compounds by simultaneously low energy deposition of carbon and Fe, Au, Cu or Ni ions reveals a self-organization process resulting in alternating metal-rich and metal deficient layers with layer periods of about 10-20nm. The metal rich layer consists of crystalline clusters >5nm in diameter in an amorphous carbon matrix while the metal-deficient ones of a-C with homogenous distributed metal atoms or small clusters <2nm diameter. The self-organization process occurs only in a certain parameter regime for ion energies and C+/metal+ fluence ratios. By proper selection of the ratio it is possible to deposit metal-carbon nanocomposite films with homogenously distributed metal clusters (<2nm) in an a-C matrix . We investigated the metal-carbon nanocomposites for the simultaneous depositon of C+ and Ni+, Cu+. The films were analyzed by Rutherford backscattering spectroscopy (RBS), energy dispersive X-ray (EDX) and cross-section transmission electron microscopy (TEM). The results are in agreement with a model for multilayer formation based on an interplay of sputtering, surface segregation, ion induced diffusion and the stability of small clusters against ion bombardment.