Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films
DS 17.26: Poster
Dienstag, 26. Februar 2008, 09:30–13:30, Poster A
Nano-hole filling with Iron oxides by Atomic Layer Deposition (ALD) — Christian Pfahler1, •Marc Saitner1, Alfred Plettl1, Paul Ziemann1, Johannes Bikupek2, Jens Leschner2, Ute Kaiser2, Julien Bachmann3, Yuen Tung Chong3, and Kornelius Nielsch3 — 1Institut für Festkörperphysik, Universität Ulm, D-89069 Ulm, Germany — 2Materialwissenschaftliche Elektronenmikroskopie, Universität Ulm, D-89069 Ulm, Germany — 3Institut für Angewandte Physik, Universität Hamburg, D-20355 Hamburg, Germany
Well-ordered periodic nanomasks are generated by a micellar technique [1] and are subsequently used for the preparation of ordered arrays of nanopores. For this purpose a CF4/CHF3-gas mixture is applied for etching of Si [2]. The order of the masks is transferred to arrays of pores with diameters between 20 and 30 nm and aspect ratios up to about 10.
After cleaning the substrates by heating in vacuum, the holes are filled with Fe2O3 by ALD at 200 ∘C using ferrocene and ozone as precursors. The Fe2O3 filling can be reduced to Fe3O4 for further magnetic studies.
The samples are mainly characterized by high resolution scanning (HRSEM) and high resolution transmission electron microscopy (HRTEM) revealing the three dimensional structure.
[1] G. Kästle et al., Adv. Funct. Mat. 13, 853 (2003).
[2] S. Brieger et al., Nanotechnology 17, 4991 (2006).