Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.33: Poster

Dienstag, 26. Februar 2008, 09:30–13:30, Poster A

Thickness-dependency of electroreflectance spectra at titanium oxide films — •Andreas M. Zoll and Roger Thull — Lehrstuhl und Abteilung für Funktionswerkstoffe der Medizin und Zahnheilkunde, Universitätsklinikum Würzburg, Pleicherwall 2, D-97070 Würzburg

Thick titanium oxide films have not only attractive properties like good blood compatibility and good corrosion resistance making them very suitable for medical implants, but also very interesting electro optical properties investigated in this study.

The presented titanium oxide films are deposited using unfiltered arc sputtering technique on polycrystalline titanium surfaces. The film thickness is 50 - 200 nm depending ion the deposition time. Substrate temperature was kept at 300 °C.

While thin films of approx. 50 nm showed typical features of low-field electroreflectance spectra at transition energies, ER spectra of thicker films showed oscillations in the sub-gap region corresponding to the first derivative of conventional reflectance spectroscopy.

The band gap was determined using photocurrent spectroscopy and was found at 3.05 +/- 0.05 eV for all samples.