Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.41: Poster

Tuesday, February 26, 2008, 09:30–13:30, Poster A

Laser deposition of niobium as a refractory metal — •Christian Pansow, Markus Trautmann, Matthias Büenfeld, Veit Große, Frank Schmidl, and Paul Seidel — Institut für Festkörperphysik, Jena, Deutschland

Pulsed Laser Deposition (PLD) has become a powerful instrument to grow several types of thin film layers. For some high temperature applications it is essential to use metals with high melting points as conducting materials. In this work, we present the actual state of our studies on the PLD of niobium thin films grown on Si. We investigated the influence of different laser energies, substrate temperatures, argon pressures and energy densities to ensure a high film quality. Our ambition includes good conductivity, low surface roughness, film homogeneity and a low droplet density. We analysed our films with atomic force microscopy (AFM), x-ray diffraction (XRD), auger electron spectroskopy (AES) and scanning electron microscope (SEM).