Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.45: Poster

Tuesday, February 26, 2008, 09:30–13:30, Poster A

Structural evolution during direct pulsed laser interference patterning — •Stephen Riedel, Matthias Hagner, Paul Leiderer, and Johannes Boneberg — University of Konstanz, Departement of Physics, D-78457 Konstanz, Germany

Laser interference lithography with cw-lasers is widely used for the development of micro- and nanostructures on photoresists and subsequent transfer of the structures in the respective substrate. In contrast we present direct laser patterning with a single ns-pulse, where the substrate is structured by several interfering beams. For that purpose we use a frequency doubled Nd:YAG laser (FWHM = 10 ns) and intensities between 50 - 200 mJ. This allows obtaining structured areas of about 1mm². We present the energy dependence of structures on different substrates (Au, Ta, Si ...) and show some time resolved measurements on the structuring dynamics. From these measurements a model for the process is developed which is based on Marangoni effects.