Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.49: Poster

Tuesday, February 26, 2008, 09:30–13:30, Poster A

Reactive deposition of SnO2:Sb thin films utilizing HPPMS: Correlation between film properties and process parameters — •Janika Boltz, Dominik Köhl, and Matthias Wuttig — I. Physikalisches Institut (1A), RWTH Aachen, 52056 Aachen

In recent years high power pulsed magnetron sputtering (HPPMS) has gained growing interest due to its inherent advantages over conventional dcMS that mainly arise from the increased plasma density and thereby ionization of the sputtered material. It has been demonstrated e.g. for several metal targets that the large degree of ionization (up to 70%) in the sputtered species and the resulting low-energy bombardment of the substrate can promote the growth of films with increased density and low surface roughness. But only recently the new technique has first been applied also to the reactive deposition of metal oxides where e.g. a stabilization of the transition regime has been achieved. In the present work, the potential of HPPMS is explored with respect to the reactive deposition of SnO2:Sb with the aim to develop a comprehensive understanding of the correlations between process parameters and film properties. As a first step, some results of the comparison between dcMS and HPPMS will be shown where both the process characteristics and the film properties are discussed.