Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.52: Poster

Tuesday, February 26, 2008, 09:30–13:30, Poster A

Reactive Deposition of TiO_x and TiN_x Layers in a DC-Magnetron Discharge — •Stefan Wrehde¹, Marion Quaas², Robert Bogdanowicz³, Hartmut Steffen⁴, Harm Wulff², and Rainer Hippler¹ — ¹Institute of Physics, University of Greifswald, Felix-Hausdorff-Straße 6, 17489 Greifswald, Germany — ²Institute of Biochemistry, University of Greifswald, Felix-Hausdorff-Straße 4, 17489 Greifswald, Germany — ³Department of Optoelectronics and Electronical Systems, Gdansk University of Technology, ul. G. Narutowcza 11/12, 80-952 Gdansk, Poland — ⁴Leibnitz-Institute for Plasma Science and Technology e.V., Felix-Hausdorff-Straße 2, 17489 Greifswald, Germany

Thin solid TiO_x and TiN_x films have been deposited by means of a DC magnetron plasma. Reactive gas type (oxygen or nitrogen), reactive gas flow, discharge power and operation mode of the magnetron (balanced or unbalanced) have been varied. Different x-ray techniques (XPS, XR, GIXD) have been applied for research on the chemical composition and the structure of the deposited films. It was found that the operation mode of the magnetron has a significant influence on the incorporation of oxygen or nitrogen into the layers and also the deposition rate. Comparison of the results of oxygen and nitrogen experiments shows that in unbalanced magnetron mode the incorporation of oxygen into the layers is declined as that of nitrogen is enhanced. By additional application of spectroscopic ellipsometry (SE) the results of the x-ray methods could be confirmed and extended by information on the optical properties of the layers.