Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films
DS 17.53: Poster
Dienstag, 26. Februar 2008, 09:30–13:30, Poster A
Production and characterisation of bandwidth- and phase-optimised La/B4C-multilayer-mirrors for the reflection of ultra short XUV-pulses — •Stefan Hendel, Florian Bienert, Maike Laß, Wiebke Hachmann, Marc D. Sacher, and Ulrich Heinzmann — Department of Physics, Bielefeld University
The applicability of reflective optical components for the XUV region depends upon the existence of multilayer-optics. In particular multilayers for the soft X-Ray spectral range calls for new material combinations. For the photon energy range of about 180 eV Lanthanum (La) is favoured as the absorber material and Boroncarbide (B4C) as the spacer material. Thin periodic layer systems of those materials with double layer periods of 3.5 nm (La/B4C) have been produced by UHV Electron Beam Evaporation combined with Ion Polishing. In-situ layer thickness control is done by X-Ray Reflectometry and single-wavelength Ellipsometry. The characterisation of the layer purity is done by ex-situ Sputter Auger Spectroscopy, whilst structural analysis is performed by X-Ray Diffraction, Transmission Electron Microscopy and at-wavelength reflectivity measurements with Synchrotron radiation. A further goal are aperiodic (chirped) multilayers which exhibit an optimised spectral bandwidth and spectral phase required for the reflection of ultra short soft X-Ray pulses from High Harmonic Sources. We report on experimental results as well as corresponding simulations.