Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.54: Poster

Tuesday, February 26, 2008, 09:30–13:30, Poster A

Structure formation in reactively sputtered TiO₂ thin films utilizing dcMS and HPPMS deposition techniques — •Azza Amin, Dominik Koehl, and Matthias Wuttig — I. Institute of Physics IA, RWTH Aachen University

TiO₂ thin films are employed in a wide range of applications, e.g. in self-cleaning, antibacterial, antifogging or optical coatings. The as-deposited films usually either possess an amorphous structure or exist in a mixture of the anatase and the rutile phase. The anatase phase is characterized by a pronounced photocatalytic activity, while the rutile structure exhibits a high mass density and a refractive index of up to 2.8 at 2.25 eV. Due to the different physical properties of these two states, a reliable means for the tailoring of the crystalline phase is therefore desirable. The high power pulsed magnetron sputtering (HPPMS) process is expected to be an appropriate tool for this purpose as it facilitates highly ionized deposition due to extremely high peak currents. To develop a thorough understanding of the structure formation and to deposit films with tailored properties, we have performed a comparative study of dcMS and HPPMS deposition processes with the aim of also establishing a detailed description of the correlation between process parameters and film properties. First results of this study are shown.