Berlin 2008 – scientific programme
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DS: Fachverband Dünne Schichten
DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films
DS 17.59: Poster
Tuesday, February 26, 2008, 09:30–13:30, Poster A
Electrodeposition of porous ZnO on textile substrates — •Markus Mingebach1, Thomas Loewenstein1, Yvonne Zimmermann2, Andreas Neudeck2, and Derck Schlettwein1 — 1Justus-Liebig-Universität Gießen, Institut für Angewandte Physik, Heinrich-Buff-Ring 16, 35392 Gießen — 2Textilforschungsinstitut Thüringen-Vogtland e.V., Zeulenrodaer Straße 42, 07973 Greiz
Textile integrated photovoltaic cells are of interest to realize a stand-alone energy supply of textile electronics which are presently developed for applications in safety and health care. A low temperature deposition method of photovoltaic structures (< 150 °C) is required for textiles. Sensitized ZnO as a wide bandgap semiconductor applied in photoelectrochemical photovoltaic cells [1] can be utilized for this purpose. Such ZnO films can be obtained at 70 °C from aqueous zinc salt solutions by electrochemical deposition. By adding the structure directing agent EosinY to the deposition solution, highly porous films with roughness factors of about 200-400 are prepared [2]. In this study we report the growth of ZnO/EosinY hybrid films on metal coated polyamide threads and filaments. The influence of the deposition parameters like current density and hydrodynamic aspects on the electrode parameters was analyzed by scanning electron microscopy (SEM) and photoelectrochemical experiments.
[1] T. Yoshida, M. Iwaya, H. Ando, T. Oekermann, K. Nonomura, D. Schlettwein, D. Wöhrle, H. Minoura, Chem. Comm., 4, 400 (2004) [2] T. Yoshida, M. Tochimoto, D. Schlettwein, D. Wöhrle, T. Sugiura, and H. Minoura, Chem. Mater., 11, 2657 (1999)