Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 17: Poster: Trends in Ion Beam Technology, Magnetism in Thin Films, Functional Oxides, High-k Dielectric Materials, Semiconductor Nanophotonics, Nanoengineered Thin Films, Layer Deposition Processes, Layer Growth, Layer Properties, Thin Film Characterisation, Metal and Amorphous Layers, Application of Thin Films

DS 17.61: Poster

Tuesday, February 26, 2008, 09:30–13:30, Poster A

An in situ GISAX study on the shape anisotropy of sputter grown Ta — •Kai Schlage, Sebastien Couet, Ralf Röhlsberger, Andreas Timmmann, and Stephan Roth — Deutsches Elektronen Synchrotron (DESY), Hamburg, Germany

It is well known that the shape anisotropy of polycrystalline grains in thin films can strongly influence their intrinsic magnetic properties like magnetic hard and easy axes. Also buffer layers contribute to this effect. We use Grazing Incidence Small Angle X-Ray Scattering (GISAXS) to follow in-situ the structural evolution of obliquely sputter deposited Ta onto a Si wafer which is often used as buffer layer in magnetic thin film systems. GISAXS allows to follow the growth process of the films and yields the size, shape and the lateral correlations of surface structures like nanoislands in the initial stage of film growth [1]. We found a strong growth anisotropy of the Ta which can be directly related to the sputtering geometry.

[1] S.V. Roth et al., Applied Physics Letter 88, 021910 (2006)