Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 18: Poster: Towards Molecular Spintronics, Organic Thin Films, Optical Layers, Vibrational Spectroscopy, Tayloring organic interfaces

DS 18.25: Poster

Tuesday, February 26, 2008, 14:30–19:30, Poster A

Design and Performance of an Ion Beam Vacuum Deposition Apparatus Based on Electrospray Ionization — •Stephan Rauschenbach, Nicha Thontasen, Ralf Vogelgesang, Giovanni Costantini, Nicola Malinowski, and Klaus Kern — Max-Planck-Institute for Solid State Research, Stuttgart, Germany

An electrospray (ES) ion beam deposition apparatus has been developed for the high- and ultrahigh vacuum (UHV) deposition of nonvolatile molecules and nanoparticles. The source employees electrospray ionization to create gas phase ions, RF-quadrupoles and electrostatic ion optics for the formation and the guiding of the ion beam, differential pumping to overcome the vacuum gap to UHV and a time-of-flight mass spectrometer for in-situ characterization of the ion beam before deposition.

The ion beam is deposited on sample holders in high- and ultrahigh vacuum designed for ex-situ or in-situ analysis respectively. The parameters of the deposition, ion beam current and kinetic energy are measured and controlled before deposition, which together with the mass analysis gives complete control over the experiment. The apparatus is connected to an STM/AFM for in-situ analysis.

Time-of-flight mass spectrometry and ion beam deposition of small molecules, large biomolecules and nanoparticles is illustrated in some examples. Fluorescent molecules are used as soft landing probes, single and double layer islands of amphophilic molecules are grown and large nanoparticles can be deposited.