DS 25: Trends in Ion Beam Technology: From the Fundamentals to the Application
Donnerstag, 28. Februar 2008, 11:15–13:00, H 2013
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11:15 |
DS 25.1 |
Nano-Structures made by Swift Heavy Ions — •Wolfgang Bolse, Hartmut Paulus, Thunu Bolse, and Lothar Bischof
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11:30 |
DS 25.2 |
Experimental demonstration of a determinstic single ion source with an expected implantation resolution of a few nm — •Kilian Singer, W. Schnitzler, N. M. Linke, J. Eble, and F. Schmidt-Kaler
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11:45 |
DS 25.3 |
Fabrication of novel pinholes for digital in-line X-ray holography by FIB and their application — •Ruth Barth, Todd Simpson, Silvia Mittler, Michael Grunze, and Axel Rosenhahn
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12:00 |
DS 25.4 |
Optical anisotropy induced by oblique incidence ion bombardment of Ag(001) — •Herbert Wormeester, Frank Everts, and Bene Poelsema
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12:15 |
DS 25.5 |
Chemical epitaxy of quartz after alkali-ion implantation: luminescence and surface structure — Stanislawa Gasiorek, Juhani Keinonen, •Klaus-Peter Lieb, Pratap Sahoo, and Timo Savajaara
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12:30 |
DS 25.6 |
Ion beam induced effects at 15 K in z-cutLiNbO3 — •Thomas Gischkat, Frank Schrempel, and Werner Wesch
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12:45 |
DS 25.7 |
Channeling irradiation of LiNbO3 — •Tobias Steinbach, Frank Schrempel, Thomas Gischkat, and Werner Wesch
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