Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 28: Trends in Ion Beam Technology: From the Fundamentals to the Application

DS 28.5: Vortrag

Donnerstag, 28. Februar 2008, 17:15–17:30, H 2013

Controlled self-organization due to sputtering on Si surfaces by lithographic pre-patterning — •Bashkim Ziberi, Theresa Lutz, Renate Fechner, Dietmar Hirsch, Klaus Zimmer, Frank Frost, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung e. V.

Pattern formation on the surface of different materials due to low-energy ion beam erosion is a versatile tool for large scale nanostructuring. However, usually this self-organization process lacks long-range ordering and a positional control of the evolving structures. One possibility to influence the ordering and lateral positioning of structures is by using pre-patterned substrate. In this way due to spatial limitations and guided by the lateral ordering of the pre-patterned templates the evolving topography shows an improved ordering, a fabrication principle also known as guided self-organization. In this contribution results on the ripple and dot pattern formation on pre-patterned Si surfaces during low energy (≤ 2000 eV) Kr⁺+ and Xe⁺ ion beam erosion are presented. The pre-patterned substrates are fabricated by various lithographic techniques in combination with etching techniques for structure transfer. Depending on the shape of the pre-patterned structure different results are obtained. Examples are: i) formation of curved ripples on the surface, ii) perfectly square ordered dots on exact positions on the surface; iii) enhanced ordering of ripples and the formation of ripples with different orientation depending on the local surface orientation. iv) continuous and controlled change in orientation of ripples independent of the ion beam direction.