Berlin 2008 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 29: Nanoengineered Thin Films

DS 29.2: Vortrag

Donnerstag, 28. Februar 2008, 18:15–18:30, H 2013

Nano pinhole lithography for the fabrication of complex lateral structure arrays — •Nadine Geyer, Huang Cheng, Bodo Fuhrmann, Frank Syrowatka, and Hartmut S. Leipner — Interdisziplinäres Zentrum für Materialwissenschaften, Martin-Luther-Universität, 06099 Halle (Saale), Germany

This work demonstrates the function of nano pinhole lithography. In this novel technique the image written by an atom-emitting arbitrary shaped macro-sized evaporation source is projected to the nm scale using the principle of a pinhole camera. For this purpose, regular arrays of pinholes are fabricated by modification of hexagonally closed packed monolayers of monodisperse polystyrene spheres. Thermal treatment of the layers yields nearly circular shaped voids between these spheres having uniform diameter and distance to the target substrate. Imaging is realized in a high vacuum thermal evaporation system, where the substrate with the pinhole mask is placed opposite to atom-emitting objects, which were in our approach bend tungsten wires of different shapes and electroplated with nickel. By using polystyrene spheres of different radii, the projection scale could be varied. Scales up to 1:100 000 and images with minimum line widths of < 50 nm could be obtained.