DS 29: Nanoengineered Thin Films
Donnerstag, 28. Februar 2008, 18:00–19:30, H 2013
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18:00 |
DS 29.1 |
Glancing angle deposited Si nanostructures on differently patterned substrates — •Christian Patzig, Bernd Rauschenbach, and Bodo Fuhrmann
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18:15 |
DS 29.2 |
Nano pinhole lithography for the fabrication of complex lateral structure arrays — •Nadine Geyer, Huang Cheng, Bodo Fuhrmann, Frank Syrowatka, and Hartmut S. Leipner
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18:30 |
DS 29.3 |
Self-assembled Fe nanowires on (2x3)N-induced Cu(110) surface — •Xiaodong Ma, Dmitri Bazhanov, Fikret Yildiz, Marek Przybylski, Valeriy Stepanyuk, Toshihiko Yokoyama, and Jürgen Kirschner
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18:45 |
DS 29.4 |
Metal nanostructure matrices through laser-patterning of thin films using phase mask projection — •Marisa Mäder, Jürgen Gerlach, Thomas Höche, Michael Lorenz, Marius Grundmann, and Bernd Rauschenbach
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19:00 |
DS 29.5 |
Physico-chemical Properties of Metal-Polymer Nanocomposite Films near the Percolation Threshold — •Vladimir Zaporojtchenko, Haile Takele, Christian Hanisch, Amit Kulkarni, Thomas Strunskus, and Franz Faupel
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19:15 |
DS 29.6 |
Electrical characterization of conducting ion tracks in insulating tetrahedral amorphous carbon — •Hans-Gregor Gehrke, Anne-Katrin Nix, Johann Krauser, Christina Trautmann, and Hans Hofsäss
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