Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 30: Layer Properties: Electrical, Optical and Mechanical Properties

DS 30.4: Talk

Thursday, February 28, 2008, 10:15–10:30, H 2032

Simulations on Grazing-Incidence Reflectometry in the XUV for Thin Film Structures — •Matus Banyay and Larissa Juschkin — RWTH Aachen - Department of Optical System Technology

Grazing-incidence reflectometry using extreme-ultraviolet light (XUV) of 4-40 nm enables to characterize thin film structures on the nanometer scale. Composition, thickness and surface roughness of a deposited layer system can be determined indirectly from its reflectivity curve by non-linear regression techniques and the combined Nevot Croce[1]- and general transfer-matrix formalism[2] for X-ray reflectivity. Here the reflectivity can either be determined as a function of incident wavelength at a fixed grazing angle or vice versa. This way it is even possible to specify a root-mean-square (rms) surface roughness of hidden layer-interfaces in the depth of a stack. We present our simulations on thin-film structures and materials that are of importance in XUV applications, e.g. Si, SiO₂, Zn, C, Mo, Ag. Results show that the amount of noise in the reflectivity curve imposes a boundary on the fitting precision. First data from laboratory based XUV-reflectometers is used to determine different layer-structures. Simulations on more complex systems (>10 layers) are planned. The results will help to estimate the possibilities of our planned experimental setup (supported by BMWi-InnoNet) that will be presented at the end of the talk while the main focus lies on the simulations.

[1] L. Nevot, P. Croce, Rev. Phys. Appl. 15, 761 (1980); [2] A. Gibaud, S. Hazra, Curr Sci., 78, 12 (2000);