Berlin 2008 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 11: C/diamond

HL 11.5: Vortrag

Montag, 25. Februar 2008, 12:00–12:15, EW 202

Scratching Multilayer Graphene with an Atomic Force Microscope — •Patrick Barthold, Thomas Lüdtke, and Rolf J. Haug — Institut für Festkörperphysik, Leibniz Universität Hannover, D-30167 Hannover

The atomic force microscope (AFM) is a well known tool used for structuring devices on different materials. Besides others, one way is to scratch the surface and thus create insulating lines. We used this technique on thin graphite films. In situ measurements of the resistance while the sample was mounted and electrically contacted in the AFM show an astonishing reversible change in the resistance when the sample was scratched with a diamond coated tip. After moving the tip several times across the sample the resistance changes permanently.
We contribute the reversible effect to induced and then moving defects in the graphite, whereas the irreversible change indicates that different layers have been cut through.