Berlin 2008 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

HL: Fachverband Halbleiterphysik

HL 17: Poster I

HL 17.27: Poster

Montag, 25. Februar 2008, 16:30–19:00, Poster D

Correlations of the structural and electrical characteristics of magnetron-sputtered ZnO:Al- and Molybdenum thin films — •Jennifer Heinemann¹, Ingo Riedel¹, Frank Hergert², and Jürgen Parisi¹ — ¹Energy- and Semiconductor Research Laboratory, Department of Physics, University of Oldenburg, Carl-von-Ossietzky-Strasse 9-11, D-26111 Oldenburg — ²Johanna Solar Technology GmbH, Münstersche Straße 24, D-14772 Brandenburg an der Havel

This contribution reports on investigations of the n-ZnO:Al-front contact and Molybdenum-back electrode used in Cu(In,Ga)(S,Se)2 thin film solar cells. The transparent ZnO:Al-window contact (band gap: 3.3eV) and the Mo-electrode were both deposited by DC-Magnetron-Sputtering. By variation of the deposition parameters like Argon pressure, sputtering power, deposition rate and substrate temperature the properties of the films (e.g. grain size, textured growth, sheet conductivity) change. This requires to correlate the structural and morphological qualities with the electrical behavior. The aim of this work is to study the structural properties of the electrode materials as systematically varied by the applied process parameters and to establish their impact on the electrical film characteristics. The sheet resistance and the according conductivity of the differently prepared films were measured by four-probe current-voltage measurements. Structural and morphological properties were investigated by X-ray diffraction, force and scanning electron microscopy.