Berlin 2008 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
HL: Fachverband Halbleiterphysik
HL 51: Poster IV
HL 51.33: Poster
Donnerstag, 28. Februar 2008, 16:30–19:00, Poster D
High pressure investigations of the Mott insulator GaV4S8 — Xin Wang1, •Martin K. Forthaus2, Karl Syassen1, Ingo Loa1, Dirk Johrendt3, and Mohsen M. Abd-Elmeguid2 — 1Max-Planck-Institut für Festkörperforschung, Stuttgart, Germany — 2II Physikalisches Institut, Universität zu Köln, Köln, Germany — 3Department Chemie and Biochemie der Ludwig-Maximilians-Universität München, München, Germany
AM4X8 (A=Ga; M=V, Mo, Nb, Ta; X=S, Se) compounds with the cubic fcc GaMo4S8 type structure represent a new class of Mott insulators in which the electronic conduction originates from hopping of localized electrons (S = 1/2) among widely separated tetrahedral M4 metal clusters. Current research on GaNb4Se8 and GaTa4Se8 show that their ground state is closely related to a structural instability: at ambient pressure they are nonmagnetic insulators, but under pressure transform to a metallic and superconducting state. In contrast, GaV4S8 is a ferromagnetic insulator (TC=10 K) at ambient pressure.
For a better understanding of the electronic correlations, we have investigated the effect of pressure on the electrical transport, crystal structure, Raman modes, and infrared response of the Mott insulator GaV4S8. We discuss our observation of a pressure-induced insulator metal transition above 18 GPa and its possible connection to a structural instability, Raman modes and infrared response.