Berlin 2008 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 18: Poster I : Bio Magn. (1-2); Mag.Imgaging (3-9); Magn. Semiconductors (10-16); Half Metals & Oxides (17-20); Coupl.Phenomena (21-27); Magn. Mat. (28-41); Micro & Nanostr. Magn. Materials (42-61); Micro Magn. (62-64); Surface Magnetism (65-70); Transport Phenomena (71-85)
MA 18.80: Poster
Dienstag, 26. Februar 2008, 15:15–18:30, Poster E
Magnetic tunnel junctions with TiO barrier — •Zoe Kugler, Andy Thomas, and Günter Reiss — Bielefeld University, Universitätsstraße 25, D-33615 Bielefeled
We investigated magnetic tunnel junctions based on TiO and TiO/AlSiO-composite barriers.
Tunnel junctions with these barriers were prepared by dc- and rf-magnetron sputtering in a vacuum system with a base pressure of 1· 10−7 mbar and postoxidation of the barrier materials.
We have investigated the influence of different oxidation times, barrier thickness and annealing temperatures. Futhermore, we will present the results of our measurements for TiO based tunnel junctions with different magnetic electrodes such as CoFeB, CoFe and NiFe.
For the TiO/AlSiO-composite barriers we have investigated the TMR- and the area-resistance ratio with respect to the TiO and AlSiO thickness.