Berlin 2008 – scientific programme
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MA: Fachverband Magnetismus
MA 32: Postersession II: Spinstruct./Phase Trans. (1-10); Spinelectronics (11-15); Thin Films (16 - 36); Particles/Clusters (37-45); Multiferroics (46-54); Spindynamics/Spin Torque (55 - 76); Post Deadlines (77-79)
MA 32.50: Poster
Friday, February 29, 2008, 11:15–14:00, Poster E
Atomic Layer Deposition and Characterization of BiFeO3 Thin Films — •Philipp Leufke1, Jens Ellrich1, and Horst Hahn1,2 — 1Institut für Nanotechnologie, Forschungszentrum Karlsruhe, D-76021 Karlsruhe, Germany — 2Fachbereich Material- und Geowissenschaften, Petersenstrasse 23, TU Darmstadt, 64287 Darmstadt, Germany
We report on the deposition of multiferroic thin films of bismuth ferrite (BiFeO3) [1] by ALD (atomic layer deposition) using different Fe and Bi precursors at various deposition conditions.
Surface morphology and crystal structure of the prepared thin films are investigated by means of scanning electron microscopy and X-ray diffraction. Energy-dispersive X-ray spectroscopy is employed for chemical analysis.
The magnetic properties are explored via superconductive quantum interference device magnetometry, measurement of the magnetooptical Kerr effect and depth selective conversion electron Mößbauer spectroscopy, with regard to the disagreements raised by former studies on pulsed laser deposited BiFeO3 thin films [2].
W. Eerenstein et al., Nature 442, 759-765 (2006)
(a) J. Wang et al., Science 299, 1719-1722 (2003); (b) W. Eerenstein et al., Science 307, 1203a- (2005); (c) J. Wang et al., Science 307, 1203b- (2005)