Berlin 2008 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 23: Poster session
MM 23.5: Poster
Dienstag, 26. Februar 2008, 14:45–18:00, Poster B
Soft absorption edges studied with hard x rays — •Henning Sternemann1, Christian Sternemann1, John S. Tse2, Juha A. Soininen3, Yong Q. Cai4, Serge Desgreniers5, Timothy T. Fister6, Nozomu Hiraoka4, Achim Hohl7, Andreas Schacht1, Gerald T. Seidler6, György Vankó8,9, Simo Huotari8, Keijo Hämäläinen3, and Metin Tolan1 — 1Fakultät Physik / DELTA, TU Dortmund, Germany — 2Dept. Phys. & Engn. Phys., U Saskatchewan, Canada — 3Div. X-ray Phys., Dept. Phys. Sci., U Helsinki, Finland — 4NSRRC, Hsinchu, Taiwan — 5Dept. Phys., U Ottawa, Canada — 6Phys. Dept, U Washington, USA — 7Inst. Mat. Sci., TU Darmstadt, Germany — 8ESRF, Grenoble, France — 9KFKI, Budapest, Hungary
Non-resonant inelastic x-ray scattering is a powerful tool to access shallow absorption edges using hard x-rays. This allows the study of low energy transitions under conditions which do not permit electrons and soft x rays as a probe. We present a variety of non-resonant inelastic x-ray scattering measurements of Si based compounds. Applications range from L-edge studies of elemental Si [1] and bulk amorphous Si monoxide [2] to the study of giant dipole resonances of Ba and I endohedrally intercalated in complex silicon networks. The experimental results are compared to calculations employing a real-space multiple-scattering approach [3]. Implications on the study of high-pressure induced phase transitions will be emphasized.
[1] H. Sternemann et al., Phys. Rev. B 75, 075118 (2007). [2] C. Sternemann et al., J. Phys. Chem. Solids 66, 2277 (2005). [3] J.A. Soininen et al., Phys. Rev. B 72, 045136 (2005).