Berlin 2008 – scientific programme

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MM: Fachverband Metall- und Materialphysik

MM 25: SYM Thin Film Magnetic Materials: Microstructure, Reaction and Magnetic Coupling IV

MM 25.5: Talk

Wednesday, February 27, 2008, 17:30–17:50, H 1058

Ion damage during FIB-milling of nanostructures into magnetite thin films — •Anjela Koblischka-Veneva¹ and Michael R. Koblischka² — ¹Institute of Functional Materials, Saarland University, P. O. Box 151150, D-66041 Saarbrücken, Germany — ²Institute of Experimental Physics, Saarland University, P. O. Box 151150, D-66041 Saarbrücken, Germany

Nanostructures are prepared into magnetite (Fe3O4) thin films grown on (0 0 1) MgO substrates by means of focused ion beam (FIB) milling. The resulting ion damage is analyzed using the electron backscatter diffraction (EBSD) technique enabling the determination of crystal orientation with a spatial resolution of about 40 nm. Depending on the ion currents and radiation dose applied during the FIB milling, different types of damage are observed. Only at relatively low ion currents, the nanostructures can be created without causing damage to the surrounding magnetite film. This enables the creation of e.g., markers in order to relocate a given sample section in different experiments like EBSD and magnetic force microscopy (MFM). At high ion currents, an entire ring area around the fabricated nanostructure is affected by the ion beam. The EBSD analysis reveals that new, small grains with a distinct, different orientation pattern are created within the ring area. This could be used to create sample areas with a distinct orientation with respect to the remainder of the magnetite film.