Berlin 2008 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)
O 18.17: Poster
Montag, 25. Februar 2008, 18:30–19:30, Poster F
EUV/XUV-Radiation: a New and Versatile Tool for Structural and Chemical Surface Analysis — •Armin Bayer, Frank Barkusky, Stefan Döring, Christian Peth, Michael Reese, and Klaus Mann — Laser-Laboratorium Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen
One of the most distinct features of EUV/XUV radiation in the regime of 2...20 nm is the strong interaction cross section to almost every material giving rise to penetration depths of about a few hundred nanometers for normal incidence light. Since the order of magnitude of the applied wavelength is comparable to typical dimensions of nanostructures, EUV/XUV light serves as an ideal tool for surface near probing of nanostructured samples.
The Laser-Laboratorium Göttingen e.V. has developed a laser-driven plasma source for generation of soft x-rays in the above mentioned spectral range. A Nd:YAG laser (1064 nm, 800 mJ, 6 ns) is focused into a gas-target leading to plasma formation which in turn emits characteristic soft x-ray radiation. Depending on the employed target gas, narrow-band as well as broad-band spectra can be obtained.
Based on this light source, a Θ-2Θ-reflectometry setup as laboratory metrology tool for in-band characterization of surfaces is currently being developed, enabling the future determination of both the chemical composition (reflectometry and NEXAFS experiments) and surface morphology (scatterometry and diffractometry experiments).
In this contribution we present the experimental concept, possible measurement techniques, numerical simulations as well as first results.