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O: Fachverband Oberflächenphysik
O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)
O 18.49: Poster
Montag, 25. Februar 2008, 18:30–19:30, Poster F
Microscale structure formation at the surface of the intercalation system TaS2:Rb — Jens Buck1, •Eric Ludwig1, Florian Kronast2, Kai Rossnagel1, Hermann Dürr2, and Lutz Kipp1 — 1IEAP, Uni Kiel — 2BESSY, Berlin
Several effects at the surface of the transition metal dichalcogenide TaS2 occuring under deposition of Rubidium have already been studied in the past, among them nanowire network formation and the well-known metal-insulator transition. Results from spatially resolved experiments such as PEEM reveal a variety of new surface structures at the microscale. The evolution of such structures at increasing Rb concentration was examined stepwise with regard to chemical composition and topography. In contrast to preliminary results, no creation of surface cracks could be observed. It is therefore suggested that crack formation strongly depends on the preparation conditions and the sample history. The PEEM measurements were performed at beamline UE49-PGMa at BESSY,Berlin.