Berlin 2008 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

O: Fachverband Oberflächenphysik

O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)

O 18.51: Poster

Montag, 25. Februar 2008, 18:30–19:30, Poster F

Direct Writing of Nanostructures with an Electron-Beam in Ultra High Vacuum: Concepts, Results and Rerspectives — Michael Schirmer, Thomas Lukasczyk, Marie-Madeleine Walz, Florian Vollnhals, Miriam Schwarz, Hans-Peter Steinrück, and •Hubertus Marbach — Universität Erlangen-Nürnberg, Lehrstuhl für Physikalische Chemie II, D-91058 Erlangen

The engineering of nanostructures with controlled shape and chemical composition is of pivotal importance for a large number of technological applications as well as for fundamental research. In this work we discuss the generation of nanostructures by using an electron-beam in an ultra high vacuum (UHV) environment. The presented approaches are based on the capability of a high energy electron beam to locally modify adsorbed precursor molecules or the properties of the substrate. Our main method is the electron-beam induced deposition (EBID). The novel aspect is to work in an ultra clean environment, i.e., UHV, which allows us to overcome a hitherto existing limitation concerning the rather poor cleanliness of the deposits and the size limitation due to electron-beam spread in bulk substrates. The successful generation of clean metallic and oxidic nanostructures with lithographic controlled shapes and with lateral dimensions partially smaller than 10 nm on different substrates are reported. The underlying processes, the perspectives and applications of EBID in UHV as well as alternative methods to exploit an electron-beam for lithographic nanostructuring will be discussed. Supported by DFG grant MA 4246/1-1.