Berlin 2008 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)
O 18.55: Poster
Montag, 25. Februar 2008, 18:30–19:30, Poster F
Electron-Beam Induced Deposition (EBID) for the Generation of Nanostructures on Inert Metal Single Crystal Surfaces — •Marie-Madeleine Walz, Michael Schirmer, Thomas Lukasczyk, Hans-Peter Steinrück, and Hubertus Marbach — Universität Erlangen-Nürnberg, Lehrstuhl für Physikalische Chemie II, D-91058 Erlangen
Nanoelectronic devices, quantum computing and the generation of specific catalytically active structures are some applications in the fast growing field of nanotechnology. The prerequisite in this field is the generation of nanostructures of high purity and defined shapes. For this purpose electron-beam induced deposition was applied under ultra high vacuum (UHV) conditions. With this method, adsorbed precursor molecules are locally cracked, mainly by secondary electrons resulting from the impact of a high energy primary electron-beam from a scanning electron microscope (SEM). After the successful generation of clean metallic and oxidic nanostructures on semiconductor and reactive metal substrates, this contribution focuses on inert metal surfaces as substrates. Thereby, unwanted processes, like the catalytic decomposition of the precursor molecules without electron exposure, should be reduced. The generation of metallic or oxidic nanostructures was performed with various organometallic precursor molecules. One example is the fabrication of titanium oxide nanostructures on a Au(111) surface using Ti(iOPr)4 as precursor molecule. The chemical composition was studied by local Auger electron spectroscopy (AES). The work is supported by DFG grant MA 4246/1-1.