Berlin 2008 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)

O 18.67: Poster

Montag, 25. Februar 2008, 18:30–19:30, Poster F

Nanosecond-laser interference pattering at 266nm wavelength — •Mike Hettich, Stephen Riedel, Paul Leiderer, and Johannes Boneberg — University of Konstanz, Departement of Physics, D-78457 Konstanz, Germany

Direct laser interference patterning by ns-laser pulses allows producing periodic surface structures in a single illumination step. For that purpose thin metallic films (Au, Ta) or Si wafers are irradiated by two or more interfering laser beams. The local intensity variations achieved in this way induce lateral flow of material. We show that this enables achieving structures with a periodicity down to 150nm, if the fourth harmonic of a ns-Nd:YAG-laser is used. Upon moving the substrate laterally between the first and subsequent illumination steps, structure periods below λ/2 can be realized.