Berlin 2008 – scientific programme
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O: Fachverband Oberflächenphysik
O 18: Poster Session I - MA 141/144 (Atomic Wires; Size-Selected Clusters; Nanostructures; Metal Substrates: Clean Surfaces+Adsorption of Organic / Bio Molecules+Solid-Liquid Interfaces+Adsorption of O and/or H; Surface or Interface Magnetism; Oxides and Insulators: Clean Surfaces)
O 18.74: Poster
Monday, February 25, 2008, 18:30–19:30, Poster F
Preparation and Characterization of Gold Nanocrystals on the native Oxide Layer of Si-Surfaces — •Jawad Slieh, Andreas Winter, Aaron Gryzia, Armin Brechling, Wiebke Hachmann, and Ulrich Heinzmann — Molecular and Surface Physics, Bielefeld University
We report on the fabrication of gold crystals in the size range between one hundred nm and several µm, using a combination of a sputter and an annealing technique. Gold was deposited on the native oxide layer of freshly cleaned silicon wafer pieces (10 × 10 mm2) in an inert gas sputtering chamber at a rate of 5 nm/min. Subsequently the samples were transferred into a UHV chamber and annealed for several hours at temperatures between 800∘C and 1000∘C. The deposited gold layer thickness and the annealing temperature and time have been studied systematically. After preparation, the gold crystals were characterized by means of different techniques such as Atomic Force Microscopy (AFM), Transmissions Electron Microscopy (TEM), Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD) and Laue Diffraction.
These different sized gold crystals will be used in a diffraction experiment (Laue configuration) with a micro focus x-ray tube (Oxford Instruments UltraBright) in order to estimate the minimal crystal size for the observation of diffraction spots of individual gold crystals. First results of these experiments will also be discussed.