Berlin 2008 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 33: Symposium: Frontiers of Surface Sensitive Electron Microscopy I (Invited Speakers: James Hannon, Raoul van Gastel, Thomas Schmidt)
O 33.7: Hauptvortrag (ohne Erstattung)
Dienstag, 26. Februar 2008, 15:45–16:15, MA 005
SMART - Spectromicroscopy with aberration correction for high resolution surface characterization — •Th. Schmidt1,2, F. Maier1, H. Marchetto2, P. Lévesque2, U. Groh1, R. Fink3, H.-J. Freund2, E. Umbach1,7, and SMART- Collaboration1,2,3,4,5,6 — 1University of Würzburg, EP II — 2Fritz-Haber-Institute, Berlin — 3University of Erlangen, PC — 4TU Darmstadt — 5TU Clausthal — 6Carl Zeiss NTS GmbH — 7Forschungszentrum Karlsruhe
Combining high-brilliance synchrotron radiation with a parallel imaging LEEM or PEEM allows a comprehensive characterization of surfaces, adsorbates, and ultrathin films. The SMART (Spectro-Microscope with Aberration correction for many Relevant Techniques), installed at BESSY, aims at a lateral resolution of 2 nm and an energy resolution of 100 meV, which can only be achieved by aberration correction and energy filtering. The actual lateral resolution of 3.1 nm is already the best for this kind of microscope. Using different sources (polarized x-rays, UV-light, electron gun) the SMART excels as a versatile instrument by imaging photo-emitted (XPEEM, UV-PEEM) and reflected electrons (LEEM) to study the morphology, chemical distribution, electronic state, molecular orientation, atomic steps, etc. Fast switching enables spectroscopy (nano-XPS, nano-NEXAFS, etc.) and (b) diffraction from small object areas (nano-PED = photoelectron diffraction, valence band mapping, LEED, etc). First experiments on the growth properties of organic thin films show the potential of the instrument and will be briefly presented. Funded by the BMBF, contract 05 KS4 WWB/4.