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15:15 |
O 53.1 |
Investigation of surface modifications induced by swift heavy ions in the MeV regime. Part I: Experiment — •Sevilay Akcöltekin and Marika Schleberger
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15:30 |
O 53.2 |
Investigation of surface modifications induced by swift heavy ions in the MeV regime. Part II : Theory — •Orkhan Osmani and Marika Schleberger
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15:45 |
O 53.3 |
X-ray scattering and diffraction from Xe-induced ripples in crystalline silicon — •Andreas Biermanns, Ullrich Pietsch, Souren Grigorian, Jörg Grenzer, Stefan Facsko, Antje Hanisch, Dina Carbone, and Hartmut Metzger
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16:00 |
O 53.4 |
High energy Xe+ ion beam induced ripple structures on silicon — •Antje Hanisch, Joerg Grenzer, Stefan Facsko, Ingolf Winkler, Andreas Biermanns, Souren Grigorian, and Ullrich Pietsch
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16:15 |
O 53.5 |
Continuum model for pattern formation on ion-beam eroded surfaces under target rotation — •Karsten Dreimann and Stefan Jakob Linz
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16:30 |
O 53.6 |
Bifurcation behavior of the anisotropic damped Kuramoto-Sivashinsky equation — Christian Rehwald, Karsten Dreimann, Sebastian Vogel, and •Stefan Jakob Linz
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16:45 |
O 53.7 |
Electron beam stimulated thermal desorption of oxygen: a lithographic method — •Jan Rönspies, Tammo Block, Svend Vagt, and Herbert Pfnür
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17:00 |
O 53.8 |
A new approach to Electron Beam Chemical Lithography — •Nirmalya Ballav, Sören Schilp, and Michael Zharnikov
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17:15 |
O 53.9 |
Lithographic Fabrication of Clean Oxidic Nanostructures by Means of Electron-Beam Induced Deposition (EBID) — •Michael Schirmer, Thomas Lukasczyk, Florian Vollnhals, Miriam Schwarz, Hans-Peter Steinrück, and Hubertus Marbach
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17:30 |
O 53.10 |
Fabrication of Clean Iron Nanostructures with Arbitrary Shape via an Electron-Beam Induced Process — •Thomas Lukasczyk, Michael Schirmer, Hans-Peter Steinrück, and Hubertus Marbach
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17:45 |
O 53.11 |
Surface nano-patterns with high structural regularity, tunable properties, and diverse applications — •Yong Lei and Gerhard Wilde
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18:00 |
O 53.12 |
Ordered nanomasks on Si and SiO2 surfaces for the preparation of templates on the nanoscale — •Alfred Plettl, Marc Saitner, Fabian Enderle, Achim Manzke, Christian Pfahler, and Paul Ziemann
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18:15 |
O 53.13 |
Self-organized nano-patterning of solid surface: dependence on the target material — •Olga Varlamova, Guobin Jia, and Juergen Reif
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