Berlin 2008 – scientific programme

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O: Fachverband Oberflächenphysik

O 53: Surface Nanopatterns

O 53.10: Talk

Wednesday, February 27, 2008, 17:30–17:45, MA 043

Fabrication of Clean Iron Nanostructures with Arbitrary Shape via an Electron-Beam Induced Process — •Thomas Lukasczyk, Michael Schirmer, Hans-Peter Steinrück, and Hubertus Marbach — Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg, Egerlandstr. 3, D-91058 Erlangen

The generation of pure metallic nanostructures with arbitrary shape is still a fundamental challenge in the fast growing field of nano science. Our approach is the technique of electron-beam induced deposition (EBID) in ultra high vacuum (UHV), in which a highly focused spot of electrons is utilized to locally crack adsorbed precursor molecules, resulting in the deposition of non-volatile fragments. An electron-column, integrated in an UHV-Chamber, in combination with a lithographic package enables the controlled fabrication of nanostructures, which can be characterized via scanning electron microscopy, scanning tunneling microscopy and Auger electron spectroscopy. The precursor iron pentacarbonyl (Fe(CO)₅) proved to be very effective for the generation of pure iron structures on silicon and rhodium single crystal surfaces. For both substrates the deposits are composed almost completely of iron. Interestingly, on Si(100), the deposited nanostructures are discontinuous in shape, consisting of pure iron dots smaller than 10 nm. The deposit purity and appearance is greatly influenced by the substrate temperature and the surface condition. Furthermore, it will be discussed that UHV is mandatory to achieve pure metallic deposits. This work was supported by the Deutsche Forschungsgemeinschaft under grant MA 4246/1-1.