Berlin 2008 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 53: Surface Nanopatterns

O 53.8: Vortrag

Mittwoch, 27. Februar 2008, 17:00–17:15, MA 043

A new approach to Electron Beam Chemical Lithography — •Nirmalya Ballav, Sören Schilp, and Michael Zharnikov — Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany

We present a new lithographic technique - electron beam chemical lithography (EBCL) with aliphatic self-assembled monolayers (SAMs) as resist materials. The technique is based on irradiation-promoted exchange reaction (IPER). The key idea of the IPER approach is tuning the extent of the exchange-reaction between a SAM covering the substrate and a potential molecular substituent by electron irradiation, which allows to get binary mixed SAMs of variable composition depending on the dose. Since the irradiation can be performed by a focused electron beam, IPER can be directly implemented into the lithographic framework and used for the fabrication of different chemical pattern on micro- and nanometer length scales. We demonstrated a feasibility of such approach by the preparation of chemical templates for the surface-induced polymerization (SIP) of the test polymer poly-N-isopropylacrylamide. Using these templates, we fabricated polymer micro- and nanobrushes in a broad height range. The advantages of EBCL-IPER are (i) the use of commercially available aliphatic compounds; (ii) a broad variety of different chemical patterns; and (iii) much lower patterning dose as compared to aromatic resists used before for EBCL. The approach is not limited by SIP, but can be used for different applications, relying on chemical patterning, e.g. biomedical studies and sensor fabrication.