Berlin 2008 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 53: Surface Nanopatterns
O 53.9: Vortrag
Mittwoch, 27. Februar 2008, 17:15–17:30, MA 043
Lithographic Fabrication of Clean Oxidic Nanostructures by Means of Electron-Beam Induced Deposition (EBID) — •Michael Schirmer, Thomas Lukasczyk, Florian Vollnhals, Miriam Schwarz, Hans-Peter Steinrück, and Hubertus Marbach — Universität Erlangen-Nürnberg, Lehrstuhl für Physikalische Chemie II, Egerlandstraße 3, D-91058 Erlangen, Germany
In this contribution we present a route to generate iron oxide and titanium oxide nanostructures on different surfaces. The method we use is electron-beam induced deposition (EBID) in ultra high vacuum (UHV). Hereby, the beam of a high resolution UHV scanning electron microscope (SEM, spot size < 3 nm) is exploited to locally crack certain precursor molecules resulting in a deposit of the non volatile fragments. Two pathways to generate oxidic nanostructures are explored: (a) the selective oxidation of clean metallic EBID nanostructures (FeOx on Rh(110)); (b) the direct EBID deposition of oxide structures (TiOx on Si(001)) using a metal- and oxygen-containing precursor molecule. The latter approach leads to deposits, which contain large amounts of carbon from the precursor molecule titanium (IV) isopropoxide. Postannealing while dosing oxygen leads to the formation of clean TiOx nanocrystallites as verified by local Auger spectroscopy. The growth of the crystallites can be observed in situ by means of SEM. Latest results and the perspective of this method will be discussed. This work was supported by the Deutsche Forschungsgemeinschaft under grant MA 4246/1-1.