Berlin 2008 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 55: Poster Session III - MA 141/144 (Methods: Atomic and Electronic Structure; Particles and Clusters; Heterogeneous Catalysis; Semiconductor Substrates: Epitaxy and Growth+Adsorption+Clean Surfaces+Solid-Liquid Interfaces; Oxides and Insulators: Solid-Liquid Interfaces+Epitaxy and Growth; Phase Transitions; Metal Substrates: Adsorption of Inorganic Molecules+Epitaxy and Growth; Surface Chemical Reactions; Bimetallic Nanosystems: Tuning Physical and Chemical Properties; Oxides and insulators: Adsorption; Organic, polymeric, biomolecular films; etc.)

O 55.57: Poster

Mittwoch, 27. Februar 2008, 18:30–19:30, Poster F

A Monte Carlo study of surface diffusion driven growth of a single droplet — •Robert Heimburger — Institute for Crystal Growth, Berlin, Germany

The Vapour-Liquid-Solid-Mechanism (VLS) is proven to be a promising way to grow spatially arranged seed crystals for the growth of polycrystalline silicon layers on amourphous substrates. The study of coalescence and growth of liquid metal droplets on partially wetted surfaces is of great interest as the process is an important partial step of the Vapour-Liquid-Solid-Mechanism.

We present a detailed study of the diffusion driven evolution of droplet size in dependence of growth temperature, surface roughness and deposition rate neglecting coalescences of droplets using the Monte Carlo method. Additionally spatial concentration profiles of the growing matter are discussed. The estimates will be compared with experimental results of droplet formation on a molybdenum surface by evaporation of indium.