Berlin 2008 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 55: Poster Session III - MA 141/144 (Methods: Atomic and Electronic Structure; Particles and Clusters; Heterogeneous Catalysis; Semiconductor Substrates: Epitaxy and Growth+Adsorption+Clean Surfaces+Solid-Liquid Interfaces; Oxides and Insulators: Solid-Liquid Interfaces+Epitaxy and Growth; Phase Transitions; Metal Substrates: Adsorption of Inorganic Molecules+Epitaxy and Growth; Surface Chemical Reactions; Bimetallic Nanosystems: Tuning Physical and Chemical Properties; Oxides and insulators: Adsorption; Organic, polymeric, biomolecular films; etc.)

O 55.75: Poster

Mittwoch, 27. Februar 2008, 18:30–19:30, Poster F

Vapour phase deposition of biphenylthiol self-assembled monolayers — •Laxman Kantake, Andrey Turchanin, and Armin Gölzhäuser — Department of Physics, Physics of Supramolecular Systems, University of Bielefeld, D-33615 Bielefeld

Self-assembled monolayers (SAMs) with aromatic moieties caused recently a particular interest due to their applications in molecular electronics, nanolithography and biotechnology. To achieve high reproducibility of the SAM-based devices and nanostructures the utilization of high quality, well defined monolayers is necessary. The traditional *wet chemistry* preparation of SAMs suffers from solvent, ambient and substrate contaminations resulting often in poor quality of the molecular assemblies. On the contrary, the preparation of SAMs in UHV provides a high degree of control over the experimental parameters. We have studied the formation of 1,1*-biphenyl-4-thiol (BPT) and 4*-nitro-1,1*-biphenyl-4-thiol (NBPT) SAMs on Au surfaces by vapour deposition in UHV. The deposition parameters and the quality of monolayers were optimized and characterized by mass spectrometry and X-ray photoelectron spectroscopy (XPS). The formation of both SAMs was tuned from the sub-monolayer to the monolayer regimes.