O 63: Symposium: Frontiers of Surface Sensitive Electron Microscopy II (Invited Speakers: Jürgen Kirschner, Liviu Chelaru, Michael Bauer, Claus Schneider)
Donnerstag, 28. Februar 2008, 09:30–12:30, MA 043
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09:30 |
O 63.1 |
Hauptvortrag (ohne Erstattung):
Development of a “momentum microscope” for imaging of valence band electron states — •Juergen Kirschner, Burkhard Kroemker, and Matthias Escher
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10:00 |
O 63.2 |
Hauptvortrag (ohne Erstattung):
Imaging Surface Plasmon Polaritons: Time-resolved Two-Photon Photoelectron Emission Microscopy — •Liviu I. Chelaru
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10:30 |
O 63.3 |
A PEEM Study of the Substrate Dependence of Pentacene Thin Film Growth on Silicon — •Simone Möllenbeck, Dagmar Thien, Peter Kury, Kelly R. Roos, Dirk Wall, Michael Horn-von Hoegen, and Frank-J. Meyer zu Heringdorf
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10:45 |
O 63.4 |
Hauptvortrag (ohne Erstattung):
Subwavelength control of nano-optical fields probed by non-linear PEEM — Martin Aeschlimann, •Michael Bauer, Daniela Bayer, Tobias Brixner, F. Javier Garcia de Abajo, Walter Pfeiffer, Martin Rohmer, Christian Spindler, and Felix Steeb
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11:15 |
O 63.5 |
Energy and time resolved photoelectron emission microscopy (PEEM) measurements of nanostructured surfaces — •Christian Schneider, Martin Rohmer, Daniela Bayer, Michael Bauer, and Martin Aeschlimann
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11:30 |
O 63.6 |
Hauptvortrag (ohne Erstattung):
Probing thin film magnetism by photoemission microscopy — •Claus M. Schneider
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12:00 |
O 63.7 |
Microscopic investigation of exchange bias in Ni/FeMn bilayers — •Florian Kronast, Joachim Schlichting, Ruslan Ovsyannikov, Florin Radu, Shrawan Mishra, Hermann Dürr, and Wolfgang Eberhardt
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12:15 |
O 63.8 |
Imaging ferroelectric domains with reflected low energy electrons — •Salia Cherifi
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